Alan Colli
'Euro-Lithography'
Scanning electron microscope image of deep nano-walls etched into a silicon wafer via nanowire lithography. This approach uses bottom-up nanowires as masks to achieve conformal features into underlying films. The nanowire-masks were initially dispersed from solution, and two of them randomly assembled to form the "euro" logo. The symbol was then transferred to the Si wafer by means of deep-reactive-ion-etching (Wall depth ~ 1µm).The image has been colored and edited by Corel Photo Paint.
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